ALD（Atomic Layer Deposition）装置は、まるで「分子のミルフィーユ」を作るような繊細な成膜技術です。 CVD（化学気相成長法）が“シャワーのように原料ガスを振りかけて一気に反応させる”のに対し、ALDは“1層ずつ丁寧に原子の膜を重ねる”手法。ガスを順番 ...

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Atomic layer deposition (ALD) has received much interest since it was introduced with the name atomic layer epitaxy (ALE) in the late 1970s. ALD is based on sequential surface chemical reactions and ...

Abstract: Titanium dioxide, known as a high-k biocompatible dielectric transducer material, is processed by means of ALD and applied to a 3D structure with dimensions typical for multi-site ...