xLight, a US startup aiming to commercialize particle accelerator driven free electron lasers (FELs) for use in semiconductor production, says it has raised $40 million in a series B round of venture ...

ASML's exposure systems are expected to expose around 50 percent more wafers by 2030 than before. This requires complex technology. ASML has reached a new research milestone: a pre-series lithography ...

High-NA EUV extends resolution by increasing optical numerical aperture, but at the cost of dramatically more complex and expensive optical systems. The industry is therefore confronting a dual ...

US startup aims to develop free-electron lasers directly emitting EUV light, in place of today’s laser-driven plasma systems. xLight, a US startup aiming to commercialize particle accelerator driven ...

ALBANY - A Palo Alto, Calif.-based company called xLight is getting $150 million from the Trump administration to build a particle accelerator at Albany NanoTech. The U.S. Commerce Department and ...

SAN DIEGO, California, Feb 23 (Reuters) - Researchers at ASML Holding say they have found a way to boost the power of the light source in a key chip making machine to turn out up to 50% more chips by ...

ASML has unveiled a significant advance in the power of the light source used in its extreme ultraviolet (EUV) lithography systems, a development the company says could enable chipmakers to produce up ...

ASML has unveiled a significant advance in the power of the light source used in its extreme ultraviolet (EUV) lithography systems, a development the company says could enable chipmakers to produce up ...

Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that he claims is superior to the method currently ...