The Next Web

Lace raises $40M to replace chip-making light with helium atoms

Lace has raised $40M from Atomico and Microsoft’s M12 to build helium atom beam lithography that could etch chip features 10x ...
Semiconductor Engineering

Exploring The Frontiers Of Lithography And Patterning: Highlights From SPIE Advanced ...

High‑NA EUV's reduced field size is driving new innovation in optical proximity correction and mask synthesis.

First look inside Nanofab Reflection, a computer chip behemoth at Albany NanoTech

It’s called NanoFab Reflection. It’s expected to cost $614 million to build and is part of a $10 billion computer chip ...

Belgium's imec secures rare ASML High NA EUV tool to drive next-generation chips

By Toby Sterling LEUVEN, Belgium, March 18 (Reuters) - Belgian chip research lab imec said on Wednesday it has secured an ASML $400-million High NA EUV lithography machine--one of fewer than a dozen ...
telecom.economictimes.indiatimes

Belgium's imec secures rare ASML High NA EUV tool to drive next-generation chips

The bottom module of a $400 billion High NA EUV machine made by ASML is shown at the headquarters of Belgian chip research lab IMEC. Once fully assembled, the machine will be used to develop and ...
Miyazaki Nichi Nichi Shimbun

単一光子および多光子直接描画リソグラフィー装置市場、CAGR5.50%で ...

YH Researchによるとのグローバル単一光子および多光子直接描画リソグラフィー装置の市場は2024年の176百万米ドルから2031年には251百万米ドルに成長し、2025年から2031年の間にCAGRは5.5%になると予測されている。 ヨーロッパ（ドイツ、フランス、イギリス ...
PR TIMES

2025年01月24日(金) AndTech WEBオンライン「EUVリソグラフィ、EUVレジスト ...

株式会社AndTech（本社：神奈川県川崎市、代表取締役社長：陶山正夫、以下 AndTech）は、R&D開発支援向けZoom講座の一環として、昨今高まりを見せる最先端リソグラフィの課題解決ニーズに応えるべく、第一人者の講師からなる「最先端リソグラフィ技術 ...