Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

Producing modern semiconductor devices is an immensely challenging process. Successful execution entails advanced process nodes, novel device architectures, new materials, and many fabrication steps.

The enormous computing demands of AI and high-performance computing (HPC) applications are putting intense pressure on every aspect of chip development. Challenges arise during architecture, design, ...