Abstract: We propose a method to model the wet etch process within the Shallow Trench Isolation (STI) module in the CMOS technology. To model a process is the first step in the design of a run to run ...
Abstract: The Shallow Trench Isolation (STI) Chemical Mechanical Polishing (CMP) process has an essential role in the STI module for the fabrication of the Complementary Metal Oxide Semiconductor ...
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